Bodong pfeiffer æ°¦ mass spectrometer leak detector semiconductor equipment and materials leak detection applications - Database & Sql Blog Articles

Shanghai Bodong

Helium mass spectrometer leak detector

Semiconductor equipment and materials

Leak detection

application

Vacuum equipment is increasingly used in the semiconductor industry, such as vacuum coating equipment (evaporation, sputtering), dry-light equipment (ICP, RIE, PECVD), heat treatment equipment (alloy furnace, annealing furnace), doping equipment ( Ion implanters, etc.) These vacuum devices will play an increasingly important role as an indispensable condition for the development of semiconductor technology. Shanghai Bodong Germany Pfeiffer

Helium mass spectrometer leak detector

It has been widely used in semiconductor equipment for leak detection.
Semiconductor equipment and materials need

Leak detection

the reason:
1. Semiconductor equipment requires high vacuum, such as magnetron sputtering station, electron beam evaporation station, ICP, PECVD and other equipment. Leakage can result in high vacuum not being reached or requiring a large amount of time, which is time consuming and labor intensive;
2. High cleanliness and low water vapor in high vacuum environment. In the event of leakage of dust and suspended particles or dust in the surrounding environment, the wafer will be contaminated, the characteristics of the semiconductor will be changed and its performance will be destroyed, so it must be carried out during the production of the semiconductor device.

Helium mass spectrometer leak detection

;
3. Some semiconductor equipment should use toxic or corrosive special gases.

Helium mass spectrometer leak detection

After the low-leakage vacuum condition, these gases are not easy to leak, and the equipment can remove unreacted gases and gaseous reaction products in time to ensure the safety of workers and the atmospheric environment.
4, chip packaging, once the leak occurs, the chip will be invalid.
In summary, Shanghai Bodong Germany Pfeiffer

Helium mass spectrometer leak detector

It plays a vital role in the semiconductor industry.

Semiconductor equipment and materials

Leak detection

method:

semiconductor

Helium mass spectrometer leak detection

There are two ways

1. Vacuum method 2. Sniffer method Shanghai Bodong customer a large semiconductor manufacturer uses German Pfeiffer

Sniffer portable æ°¦ mass spectrometer leak detector ASM 102 S

Check for leaks.

Sniffer portable æ°¦ mass spectrometer leak detector ASM 102 S

Main advantages:
High sensitivity: 1x10-7 mbar.l/s or 0.1 ppm helium. High-level solutions bring a wide range of highly diagnostic and highly sensitive test tests: from 0.1 ppm to 100% helium

Helium mass spectrometer leak detector

Fast response time: within one second (using a 5 m/16 ft sniffer probe)
Fast recovery time Excellent stability: The signal stability of helium is critical for small leak detection.

Helium mass spectrometer leak detector

Three kinds of tracer gas selection: It is possible to detect helium (He3) and hydrogen (H2).
The auto-zero (ignoring the background) function enhances the radon background signal to ensure that the radon signal is always above zero.
Superior features combined with the latest standard speech analyzer in the electronic age to add functionality to the operator interface
The 1st and 2nd filaments are connected separately for easy replacement.

Helium mass spectrometer leak detector

Portability: Easy to transport (dry pump system), all accessories are built into one compartment and can be operated with a simple connection.
Easy to use: Familiar with the operation of the ASM102S in a few minutes: auto-calibration, auto-zero (ignoring the background) function for higher sensitivity, direct reading of the signal, without the need for the operator to interpret.