Recently, the ELEDETM330 high-density plasma ICP etching machine developed by Northern Microelectronics has been assembled and debugged and officially delivered to customers. ELEDETM330 is a successful expansion of the northern microelectronic semiconductor etching technology in the field of LED. The successful launch of this device marks that the domestic LED etching equipment has been recognized by the mainstream production line, which has made the domestic level of high-end LED equipment in China new. . As the first large-capacity etching equipment directly in China for LED production lines, ELEDE330 can meet all etching applications in LED fields such as sapphire substrate pattern etching, Si substrate etching and GaN-based epitaxial layer etching.
ELEDE330 adopts high-capacity design suitable for large-scale production, and can complete 27 2-inch GaN-based epitaxial layer etching or 22 2-inch sapphire substrate etching at one time, greatly improving equipment output efficiency; system integrates high-density plasma Body source, high-life mechanical chuck, precision chamber temperature control system, stable high-precision pressure control system, IC standard central nozzle air intake system and IC-level chamber surface treatment, etc. The more precise design of the etch process requires a higher performance etch process in the LED field to increase the luminescence efficiency of the LED chip to a greater extent.
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